SiC Wafer Boat for Epitaxy with Plasma Resistance

URL slug: sic-wafer-boat-plasma-resistance

Product Summary

This SiC wafer boat is specifically designed for epitaxy processes involving aggressive fluorine/chlorine plasma. The high-density CVD coating provides outstanding resistance to plasma bombardment, ensuring no coating peeling under rapid thermal cycling.

Key Selling Points

• Outstanding resistance to fluorine/chlorine plasma reduces erosion and extends service life.
• Zero coating peeling under rapid thermal cycling maintains process stability.
• High-density CVD coating ensures low particle generation and high purity.
• Operates up to 1600°C with zero deformation, supporting demanding epitaxy conditions.

Technical Specifications

Models and Options

Model: SiC-01. Options: substrate type (SiSiC/RSiC), custom size, coating thickness.

Materials and Structure

High-density CVD SiC coating on SiSiC/RSiC substrate. Structure robust enough for high-load batch processing.

Applications

Epitaxy processes, especially those involving plasma etching or cleaning steps.

Customization

Custom dimensions and coating specifications available.

Case Study

In South Korea, a customer used 500 units per month for epitaxy. Achieved stable mass production with consistent epitaxial layer quality, reduced edge ring replacement frequency by 20%.

FAQ

Q1: How does it resist plasma attack?

A: High-density CVD coating provides a tough barrier against F/Cl plasma.

Q2: Does it peel under thermal cycling?

A: No, zero coating peeling under rapid thermal cycling.

Q3: What substrate materials are available?

A: Both SiSiC and RSiC are available.

Q4: What is the temperature limit?

A: Up to 1600°C.

Q5: Can it be used in other high-temp processes?

A: Yes, it is suitable for diffusion and oxidation as well.

Q6: What is the MOQ?

A: 1 unit.

Inquiry Information

Contact: Frank, sales05@semi-cera.com, +86 15957878134. MOQ: 1 unit. Delivery terms and payment as per company policy.

Product Image

Image filename: sic-wafer-boat-plasma-resistance.png. Alt text: SiC wafer boat with plasma resistance for epitaxy.